Title	Author	Volume
Low-level laser therapy (LLLT) versus light-emitting diode therapy (LEDT): What is the difference?	Lars Hode, Irradia AB, Stockholm, Sweden; Jan Tuner, Tandlakare, Grangesberg, Sweden.	4166
Neural network approach to cloud removal in single-band SSM/I imagery	Perry J. Hardin, Brigham Young Univ., Provo, UT, USA; Mark W. Jackson, Brigham Young Univ., Provo, UT, USA.	4168
59720M Polarization characteristics of the reflecting metallized diffraction grates	"Alexander D. Arkhelyuk, Leonid I. Podkamen "	5972
Optical Signal Processing for Reflectometry with High Spatial-Resolution by Synthesis of Optical Coherence-Function	K Hotate, 0. Kamatani, "RCA ST, Research Center for Advanced Science and Technology"	1359
Alignment mark detection in CMOS materials with SCALPEL e-beam lithography	Reginald C. Farrow, Lucent Technologies/Bell Labs., Murray Hill, NJ, USA; Warren K. Waskiewicz, Lucent Technologies/Bell Labs., Murray Hill, NJ, USA; Isik C. Kizilyalli, Lucent Technologies/Bell Labs., Orlando, FL, USA; Gregg M. Gallatin, Lucent Technologies/Bell Labs., Murray Hill, NJ, USA; James A. Liddle, Lucent Technologies/Bell Labs., Scotch Plains, NJ, USA; Masis M. Mkrtchyan, Lucent Technologies/Bell Labs., Murray Hill, NJ, USA; Avi Kornblit, Lucent Technologies/Bell Labs., Murray Hill, N	3676
Highly integrated single-chip optical correlator	Michael J. O'Callaghan, Displaytech, Inc., Longmont, CO, USA; David J. Ward, Black Forest Engineering, Colorado Spgs, CO, USA; Stephen H. Perlmutter, Displaytech, Inc., Longmont, CO, USA; Lianhua Ji, Displaytech, Inc., Longmont, CO, USA; Christopher M. Walker, Displaytech, Inc., Longmont, CO, USA.	3466
High-resolution heterodyne spectrometer for the KAO (Kuiper Airborne Observatory)	Hans-Peter Roeser, DLR/Institut fuer Weltraumsensorik, Berlin, Federal Republic of Germany.	2268
Compact sealed-off rf-excited CO2 lasers	Aleksey A. Kuznetsov, P.N. Lebedev Physical Institute, Moscow, Russia; M.Z. Novgorodov, P.N. Lebedev Physical Institute, Moscow, Russia; Vladimir N. Ochkin, P.N. Lebedev Physical Institute, Moscow, Russia; S.N. Tskhai, P.N. Lebedev Physical Institute, Moscow, Russia; E.F. Shishkanov, Research Institute of Gas-Discharge Devices, Ryazan, Russia; V.A. Stepanov, Pedagogical Univ., Ryazan, Russia; Wilhelmus J. Witteman, Univ. Twente, Enschede, Netherlands.	4165
Electromigration and current-carrying implications for aluminum-based metallurgy with tungsten stud via interconnections	Hazara S. Rathore, IBM East Fishkill, Stormville, NY, USA; R.G. Filippi, IBM East Fishkill, Hopewell Junction, NY, USA; R.A. Wachnik, IBM East Fishkill, Hopewell Junction, NY, USA; J.J. Estabil, Therma-Wave Inc., Fremount, CA, USA; Thomas Kwok, IBM Thomas J. Watson Research Ctr., Yorktown Heights, NY, USA.	1805
Three-scale wavelet transforms	Raghuveer M. Rao, Rochester Institute of Technology, Rochester, NY, USA; J. Scott Bundonis, ABB Industrial Systems, Rochester, NY, USA; Harold H. Szu, Univ. of Southwestern Louisiana, Dahlgren, VA, USA.	3391
618812 Image formation in digital holography	"Fucai Zhang, Giancarlo Pedrini, Wolfgang Osten "	6188
Optical pattern recognition for validation and security verification	Bahram Javidi, Univ. of Connecticut, Storrs, CT, USA; Joseph L. Horner, Rome Lab., Hanscom AFB, MA, USA.	2237
Diffuse ultrasonics for inspection of concrete	Joseph A. Turner, Univ. of Nebraska/Lincoln, Lincoln, NE, USA.	4337
Nonlinear laser spectropolarimetry of atomic degenerated systems with lower metastable state during optical pumping in intense laser fields	A.S. Ipokov, Institute of Semiconductor Physics, Novosibirsk, Russia; I.A. Kartashov, Institute of Semiconductor Physics, Novosibirsk, Russia; A.V. Shishaev, Institute of Semiconductor Physics, Novosibirsk, Russia.	4900
Evaluation of a new photomask CD metrology tool	Leonard F. Dubuque, IBM Microelectronics Div., Jericho, VT, USA; Nick Doe, Technical Instruments Co., Sunnyvale, CA, USA; Patrick St. Cin, Technical Instruments Co., San Francisco, CA, USA.	2884
Application of polycapillary optics to hard x-ray astronomy	Christine H. Russell, SUNY/Albany, Albany, NY, USA; Walter M. Gibson, SUNY/Albany, Voorheesville, NY, USA; Mikhail V. Gubarev, SUNY/Albany, Albany, NY, USA; F.A. Hofmann, SUNY/Albany, Albany, NY, USA; Marshall K. Joy, NASA Marshall Space Flight Ctr., Hunstville, AL, USA; Carolyn A. MacDonald, SUNY/Albany, Albany, NY, USA; Lei Wang, SUNY/Albany, Albany, NY, USA; Qi-Fan Xiao, X-Ray Optical Systems, Inc., Albany, NY, USA; R.Youngman, X-Ray Optical Systems, Inc., Albany, NY, USA.	3113
1147 Effect of data selection and noise on goodness of OPC model fit	Ralph E. Schlief	5754
Order-of-magnitude faster isosurface rendering in software on a PC than using dedicated general-purpose rendering hardware	George J. Grevera, Univ. of Pennsylvania, Schenectady, NY, USA; Jayaram K. Udupa, Univ. of Pennsylvania, Philadelphia, PA, USA; Dewey Odhner, Univ. of Pennsylvania, Philadelphia, PA, USA.	3658
Surveying the elements of successful infrared predictive maintenance programs	John R. Snell, Jr., John Snell & Associates, Montpelier, VT, USA; Robert W. Spring, John Snell & Associates, Montpelier, VT, USA.	1467
Multiband frequency selective surface	Te-Kao Wu, Jet Propulsion Lab., Redondo Beach, CA, USA.	3464
Emission spectra of microplasma generated by femtosecond laser pulses	Xiaonong Zhu; Rulian Fu	4914
59780G Using multi-angle multispectral photo-polarimetry of the NASA Glory mission to constrain optical properties of aerosols and clouds: results from four field experiments	"Jacek Chowdhary, Brian Cairns, Michael I. Mishchenko, Larry D. Travis "	5978
Induced cholesteric systems based on some cyano derivatives as host phases	Natalya I. Shkolnikova; Lidiya A. Kutulya; V. V. Vashchenko; A. P. Fedoryako; V. I. Lapanik; N. R. Posledovich	4938
200 Hybrid organic-inorganic optoelectronic subsystems on a chip	"Louay Eldada, Junichiro Fujita, Antonije Radojevic, Reinald Gerhardt, Tomoyuki Izuhara "	5729
Real-time implementation of auto white balancing and auto exposure on the TI DSC platform	Hyuk-Joon Oh, Texas A&M Univ. and Texas Instruments, Inc., Dallas, TX, USA; Nasser Kehtarnavaz, Texas A&M Univ. and Texas Instruments, Inc., Richardson, TX, USA; Youngjun F. Yoo, Texas Instruments, Inc., Dallas, TX, USA; S.Reis, Texas Instruments, Inc., Dallas, TX, USA; Raj Talluri, Texas Instruments, Inc., Dallas, TX, USA.	4666

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