Secondary-Electron Emission Effects in Plasma Immersion Ion Implantation with Dielectric Substrates中国物理快报：英文版论文

Secondary-Electron Emission Effects in Plasma Immersion Ion Implantation with Dielectric Substrates中国物理快报：英文版论文

【题名】：Secondary-Electron Emission Effects in Plasma Immersion Ion Implantation with Dielectric Substrates中国物理快报：英文版论文(Secondary-Electron Emission Effects in Plasma Immersion Ion Implantation with Dielectric SubstratesZhongGuoWuLiKuaiBao：YingWenBanLunWen)
【关键词】：二级电子发射等离子体浸没离子注入电介质表面等离子体物理
【keywords】：ErJiDianZiFaShe DengLiZiTiJinMei LiZiZhuRu DianJieZhiBiaoMian DengLiZiTiWuLi
【作者】：李雪春王友年      【来源】：知识词典
【期刊名称】：中国物理快报：英文版(ZhongGuoWuLiKuaiBao：YingWenBan)
【国际标准刊号】：0256-307X        【国内统一刊号】：11-1959/O4
【作者单位】：StateKeyLaboratoryofMaterialsModification,DepartmentofPhysics,DalianUniversityofTechnology,Dalian116023(StateKeyLaboratoryofMaterialsModification,DepartmentofPhysics,DalianUniversityofTechnology,Dalian116023)
【分类号】：O532.26      【页码】：-364-366      【出版年】：2004.2
        Using a dynamic sheath model,we have studied the secondary-electron emission effects at one-dimensional planar dielectric surface in plasma immersion ion implantation.The temporal evolution of the sheath thickness,the surface potential of dielectric,and the ions dose accumulated on the dielectric surface are obtained.The numerical results demonstrate that the charging effects are greatly enhanced by the secondary electron emission effects,so the sheath thickness becomes thinner,the surface potential of dielectric decreases fast and the ions dose accumulated on the dielectric surface significantly increases.

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