Unified HMM-based layout analysis framework and algorithm中国科学：F辑英文版论文
【题名】：Unified HMM-based layout analysis framework and algorithm中国科学：F辑英文版论文(Unified HMM-based layout analysis framework and algorithmZhongGuoKeXue：FJiYingWenBanLunWen) 【关键词】：设计分析 图像分析 图像识别 光学特征识别系统 图像模型 算法 【keywords】：SheJiFenXi TuXiangFenXi TuXiangShiBie GuangXueTeZhengShiBieXiTong TuXiangMoXing SuanFa 【作者】：陈明 丁晓青 吴佑寿      【来源】： 知识词典 【期刊名称】：中国科学：F辑英文版(ZhongGuoKeXue：FJiYingWenBan) 【国际标准刊号】：1009-2757        【国内统一刊号】： 【作者单位】：DepartmentofElectronicEngineering,TsinghuaUniversity,Beijing100084,China(DepartmentofElectronicEngineering,TsinghuaUniversity,Beijing100084,China) 【分类号】：TP391.41      【页码】：-401-408      【出版年】：2003.6 【下载地址】：下载pdf全文         To manipulate the layout analysis problem for complex or irregular document image, a Unified HMM-based Layout Analysis Framework is presented in this paper. Based on the multi-resolution wavelet analysis results of the document image, we use HMM method in both inner-scale image model and trans-scale context model to classify the pixel region properties, such as text, picture or background. In each scale, a HMM direct segmentation method is used to get better inner-scale classification result. Then another HMM method is used to fuse the inner-scale result in each scale and then get better final seg-mentation result. The optimized algorithm uses a stop rule in the coarse to fine multi-scale segmentation process, so the speed is improved remarkably. Experiments prove the efficiency of proposed algorithm.
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